One additional thing I’d be interested in is AI-assisted solution of the differential equations behind better masks for EUV lithography. It seems naively like another factor of 2-ish in feature size is just sitting out there waiting to be seized, though maybe I’m misunderstanding what I’ve heard about switching back to old-style masks with EUV.
One additional thing I’d be interested in is AI-assisted solution of the differential equations behind better masks for EUV lithography. It seems naively like another factor of 2-ish in feature size is just sitting out there waiting to be seized, though maybe I’m misunderstanding what I’ve heard about switching back to old-style masks with EUV.